US Patent Issued to Lam Research on June 30 for "Gas supply line arrangements" (American, Indian Inventors)

ALEXANDRIA, Va., July 16 -- United States Patent no. 12,668,873, issued on June 30, was assigned to Lam Research Corp. (Fremont, Calif.).

"Gas supply line arrangements" was invented by Eashan Raju Dhawade (Nagpur, India), Michael Rumer (Santa Clara, Calif.) and Ravi Vellanki (San Jose, Calif.).

According to the abstract* released by the U.S. Patent & Trademark Office: "In some examples, a gas supply line arrangement is provided for inhibiting particle contamination in a substrate process chamber. An example gas supply line arrangement comprises a cleaning gas source for a clean cycle of the substrate process chamber, a purge gas source for a purge cycle of the substrate process chamber, and a gas supply line to carry cleaning gas and purg...