ALEXANDRIA, Va., June 16 -- United States Patent no. 12,655,516, issued on June 16, was assigned to Lam Research Corp. (Fremont, Calif.).

"Seam mitigation and integrated liner for gap fill" was invented by Dustin Zachary Austin (Tigard, Ore.), Ian John Curtin (Portland, Ore.), Joseph R. Abel (West Linn, Ore.), Bart J. Van Schravendijk (Palo Alto, Calif.), Seshasayee Varadarajan (Lake Oswego, Ore.), Adrien Lavoie (Newberg, Ore.), Jeremy David Fields (Portland, Ore.), Pulkit Agarwal (Beaverton, Ore.) and Shiva Sharan Bhandari (Beaverton, Ore.).

According to the abstract* released by the U.S. Patent & Trademark Office: "Methods of filling a gap with a dielectric material including using an inhibitor plasma during deposition. The inhibitor pl...