ALEXANDRIA, Va., July 28 -- United States Patent no. 12,695,060, issued on July 28, was assigned to Lam Research Corp. (Fremont, Calif.).
"Control of mask CD" was invented by Beibei Jiang (Alpharatte, Ga.), Taner Ozel (Fremont, Calif.), Chen Chen (Hayward, Calif.), Shuang Pi (Fremont, Calif.), Daksh Agarwal (Sunnyvale, Calif.), Qing Xu (Fremont, Calif.), Merrett Wong (San Carlos, Calif.) and Amit Mukhopadhyay (Fremont, Calif.).
According to the abstract* released by the U.S. Patent & Trademark Office: "A method for controlling a critical dimension of a mask layer is described. The method includes receiving a first primary parameter level, a second primary parameter level, a first secondary parameter level, a second secondary parameter lev...