US Patent Issued to Lam Research on Dec. 2 for "Matchless plasma source for semiconductor wafer fabrication" (California Inventors)

ALEXANDRIA, Va., Dec. 2 -- United States Patent no. 12,490,370, issued on Dec. 2, was assigned to Lam Research Corp. (Fremont, Calif.).

"Matchless plasma source for semiconductor wafer fabrication" was invented by Maolin Long (Santa Clara, Calif.), Yuhou Wang (Fremont, Calif.), Ricky Marsh (San Ramon, Calif.) and Alex Paterson (San Jose, Calif.).

According to the abstract* released by the U.S. Patent & Trademark Office: "A matchless plasma source is described. The matchless plasma source includes a controller that is coupled to a direct current (DC) voltage source of an agile DC rail to control a shape of an amplified square waveform that is generated at an output of a half-bridge transistor circuit. The matchless plasma source further in...