ALEXANDRIA, Va., Aug. 5 -- United States Patent no. 12,700,567, issued on Aug. 4, was assigned to Lam Research Corp. (Fremont, Calif.).

"Multi-state RF pulsing in cycling recipes to reduce charging induced defects" was invented by He Zhang (Fremont, Calif.), Chen Li (San Jose, Calif.), Kevin Lai (San Jose, Calif.) and Neil Macaraeg Mackie (Fremont, Calif.).

According to the abstract* released by the U.S. Patent & Trademark Office: "A method for etching in plasma processing in a plasma chamber, including continually rotating between a first etch cycle and a second etch cycle for a period of time to etch a feature in a masked substrate. The method including performing the first etch cycle on the masked substrate using a first etching chemis...