ALEXANDRIA, Va., April 7 -- United States Patent no. 12,598,925, issued on April 7, was assigned to Lam Research Corp. (Fremont, Calif.).

"Non-metal incorporation in molybdenum on dielectric surfaces" was invented by Lawrence Schloss (Palo Alto, Calif.), Joshua Collins (Sebastopol, Calif.), Griffin John Kennedy (Livermore, Calif.), Hanna Bamnolker (Cupertino, Calif.), Sang-Hyeob Lee (Fremont, Calif.), Patrick van Cleemput (Duvall, Wash.) and Sanjay Gopinath (Fremont, Calif.).

According to the abstract* released by the U.S. Patent & Trademark Office: "Provided herein are low resistance metallization stack structures for 3D-NAND applications and related methods of fabrication. In some embodiments, thin metal oxynitride nucleation layers are...