ALEXANDRIA, Va., April 15 -- United States Patent no. 12,601,974, issued on April 14, was assigned to Lam Research Corp. (Fremont, Calif.).
"Bake strategies to enhance lithographic performance of metal-containing resist" was invented by Timothy William Weidman (Sunnyvale, Calif.), Chenghao Wu (Berkeley, Calif.), Katie Lynn Nardi (San Jose, Calif.), Boris Volosskiy (San Jose, Calif.) and Kevin Li Gu (Mountain View, Calif.).
According to the abstract* released by the U.S. Patent & Trademark Office: "Various embodiments herein relate to methods, apparatus, and systems for baking metal-containing on a semiconductor substrate in the presence of a reactive gas species. For example, the method may include receiving the substrate in a process cha...