US Patent Issued to L'Air Liquide Societe Anonyme pour l'Etude et l'Exploitation des Procedes Georges Claude on Aug. 11 for "Deposition of noble metal islets or thin films for its use for electrochemical catalysts with improved catalytic activity" (Japanese Inventors)

ALEXANDRIA, Va., Aug. 12 -- United States Patent no. 12,703,913, issued on Aug. 11, was assigned to L'Air Liquide Societe Anonyme pour l'Etude et l'Exploitation des Procedes Georges Claude (Paris).

"Deposition of noble metal islets or thin films for its use for electrochemical catalysts with improved catalytic activity" was invented by Takashi Ono (Yokosuka, Japan), Takashi Teramoto (Yokosuka, Japan) and Christian Dussarrat (Tokyo).

According to the abstract* released by the U.S. Patent & Trademark Office: "Platinum group metal containing chemical precursors suitable for vapor deposition are disclosed. Methods of using these precursors for Platinum depositions are also disclosed. The chemical precursors and methods are particularly suitab...