US Patent Issued to KYOWA LEATHER CLOTH on Dec. 2 for "Synthetic resin skin material and manufacturing method thereof" (Japanese Inventors)

ALEXANDRIA, Va., Dec. 2 -- United States Patent no. 12,486,613, issued on Dec. 2, was assigned to KYOWA LEATHER CLOTH Co. LTD. (Hamamatsu, Japan).

"Synthetic resin skin material and manufacturing method thereof" was invented by Ryutaro Suzuki (Hamamatsu, Japan) and Masato Yamaoka (Hamamatsu, Japan).

According to the abstract* released by the U.S. Patent & Trademark Office: "A synthetic resin skin material, including a base cloth and a vinyl chloride resin skin layer that is formed on the base cloth and that includes a vinyl chloride resin having a degree of polymerization of 1,600 to 3,000 and includes 3 parts by mass to 20 parts by mass of a silicon-acrylic copolymer with respect to 100 parts by mass of the vinyl chloride resin, and a ma...