US Patent Issued to KURITA WATER INDUSTRIES on Sept. 1 for "Wafer cleaning water supply system and wafer cleaning water supply method" (Japanese Inventor)

ALEXANDRIA, Va., Sept. 1 -- United States Patent no. 12,727,422, issued on Sept. 1, was assigned to KURITA WATER INDUSTRIES LTD. (Tokyo).

"Wafer cleaning water supply system and wafer cleaning water supply method" was invented by Wataru Sugita (Tokyo).

According to the abstract* released by the U.S. Patent & Trademark Office: "The wafer cleaning water supply system of the present invention has a wafer cleaning water production unit producing wafer cleaning water having a chemical agent, a replenishment pipe extending from the wafer cleaning water production unit, and a circulation-type cleaning water supply pipe connected to the replenishment pipe. The circulation-type cleaning water supply pipe feeds a liquid to a use point via a feeding...