US Patent Issued to Korea Institute of Science and Technology on Sept. 29 for "Method of preparing high-concentration colloidal silica" (South Korean Inventors)

ALEXANDRIA, Va., Sept. 30 -- United States Patent no. 12,747,161, issued on Sept. 29, was assigned to Korea Institute of Science and Technology (Seoul, South Korea).

"Method of preparing high-concentration colloidal silica" was invented by Bok Ryul Yoo (Seoul, South Korea) and Dae Jin Kim (Seoul, South Korea).

According to the abstract* released by the U.S. Patent & Trademark Office: "Disclosed is a method of preparing colloidal silica, more particularly a method of producing high-concentration (10-55 wt %) colloidal silica by reacting water with a tetraalkyl orthosilicate (TMOS), tetraethyl orthosilicate (TEOS) based silane precursor as a starting material in the presence of a basic catalyst."

The patent was filed on May 18, 2023, under...