US Patent Issued to Korea Advanced Institute of Science and Technology on April 7 for "Fabric substrate and manufacturing method thereof" (South Korean Inventors)

ALEXANDRIA, Va., April 7 -- United States Patent no. 12,595,622, issued on April 7, was assigned to Korea Advanced Institute of Science and Technology (Daejeon, South Korea).

"Fabric substrate and manufacturing method thereof" was invented by Kyung Cheol Choi (Daejeon, South Korea), Seung Yeop Choi (Daejeon, South Korea) and Seon Il Kwon (Daejeon, South Korea).

According to the abstract* released by the U.S. Patent & Trademark Office: "According to the present invention, there is provided a fabric substrate for mounting a light emitting element. The fabric substrate comprises a fabric layer including at least one fabric, a stress buffer layer that is disposed on the fabric layer and minimizes an occurrence of physical strain and stress ca...