US Patent Issued to KOLON INDUSTRIES on Dec. 2 for "Polyimide-based film having excellent surface evenness and method for producing same" (South Korean Inventors)

ALEXANDRIA, Va., Dec. 2 -- United States Patent no. 12,486,369, issued on Dec. 2, was assigned to KOLON INDUSTRIES INC. (Seoul, South Korea).

"Polyimide-based film having excellent surface evenness and method for producing same" was invented by Hyo Jun Park (Seoul, South Korea) and Jong Won Yang (Seoul, South Korea).

According to the abstract* released by the U.S. Patent & Trademark Office: "Disclosed are a polyimide-based film and a method of producing the same, and more particularly, a polyimide-based film having excellent surface evenness and suppressed waviness due to low Kc of 1.55 or less and a method of producing the same."

The patent was filed on Sept. 14, 2020, under Application No. 17/760,759.

*For further information, includi...