ALEXANDRIA, Va., Nov. 3 -- United States Patent no. 12,787,686, issued on Nov. 3, was assigned to KOKUSAI ELECTRIC Corp. (Tokyo).
"Gas supplier, processing apparatus, and method of manufacturing semiconductor device" was invented by Kenta Kasamatsu (Toyama, Japan), Atsushi Hirano (Toyama, Japan), Tetsuo Yamamoto (Toyama, Japan) and Takafumi Sasaki (Toyama, Japan).
According to the abstract* released by the U.S. Patent & Trademark Office: "There is provided a technique that includes a first opening and a second opening which supply gases to a process chamber in which a substrate is arranged, and is configured such that: the first opening and the second opening are arranged in a direction parallel to a surface of the substrate, a gas suppli...