ALEXANDRIA, Va., Nov. 3 -- United States Patent no. 12,782,830, issued on Nov. 3, was assigned to KLA Corp. (Milpitas, Calif.).
"Spatially-varying spectral metrology for local variation detection" was invented by Zhengquan Tan (Cupertino, Calif.) and Houssam Chouaib (San Jose, Calif.).
According to the abstract* released by the U.S. Patent & Trademark Office: "A metrology system may include a light source to generate an illumination beam and a spectral metrology sub-system configured to direct the illumination beam to a sample and collect sample light from the sample. The spectral metrology sub-system may include illumination optics with at least one of an illumination polarizer or an illumination compensator, and collection optics with a...