US Patent Issued to KLA on May 12 for "Learnable defect detection for semiconductor applications" (California, Iowa Inventors)

ALEXANDRIA, Va., May 12 -- United States Patent no. 12,626,354, issued on May 12, was assigned to KLA Corp. (Milpitas, Calif.).

"Learnable defect detection for semiconductor applications" was invented by Jing Zhang (Santa Clara, Calif.), Zhuoning Yuan (Iowa City, Iowa), Yujie Dong (Newark, Calif.) and Kris Bhaskar (San Jose, Calif.).

According to the abstract* released by the U.S. Patent & Trademark Office: "Methods and systems for learnable defect detection for semiconductor applications are provided. One system includes a deep metric learning defect detection model configured for projecting a test image for a specimen and a corresponding reference image into latent space, determining a distance in the latent space between one or more di...