ALEXANDRIA, Va., March 31 -- United States Patent no. 12,592,357, issued on March 31, was assigned to KLA Corp. (Milpitas, Calif.).

"System and method for multi-beam electron microscopy using a detector array" was invented by Xinrong Jiang (Palo Alto, Calif.), Youfei Jiang (Milpitas, Calif.) and Amir Azordegan (Santa Clara, Calif.).

According to the abstract* released by the U.S. Patent & Trademark Office: "A system and method of an electron multi-beam imaging system is disclosed. The system may include an imaging sub-system. The imaging sub-system may include one or more electron beam sources configured to generate a plurality of beamlets to simultaneously probe a plurality of measurement regions on a sample. The imaging sub-system may f...