ALEXANDRIA, Va., July 15 -- United States Patent no. 12,663,728, issued on June 23, was assigned to KLA Corp. (Milpitas, Calif.).
"Oblique illumination for overlay metrology" was invented by Andrew V. Hill (Berkeley, Calif.), Yoel Feler (Haifa, Israel), Amnon Manassen (Haifa, Israel), Mark Ghinovker (Yoqneam Ilit, Israel) and Yonatan Vaknin (Yoqneam Llit, Israel).
According to the abstract* released by the U.S. Patent & Trademark Office: "An overlay metrology system may include an overlay metrology tool suitable for measurement of an overlay target on a sample, the overlay target including one or more grating structures with patterned features distributed along one or more measurement directions. The overlay metrology tool may include an ...