US Patent Issued to KLA on July 28 for "Semiconductor profile measurement based on a scanning conditional model" (California Inventor)

ALEXANDRIA, Va., July 28 -- United States Patent no. 12,694,182, issued on July 28, was assigned to KLA Corp. (Milpitas, Calif.).

"Semiconductor profile measurement based on a scanning conditional model" was invented by Stilian Ivanov Pandev (Santa Clara, Calif.).

According to the abstract* released by the U.S. Patent & Trademark Office: "Methods and systems for measuring semiconductor structures based on a trained scanning conditional measurement model are described herein. A scanning conditional model is trained based on Design Of Experiments (DOE) measurement data associated with known values of one or more parameters of interest and a set of perturbed values of the one or more parameters of interest. The trained conditional model mini...