US Patent Issued to KLA on Dec. 2 for "System and method for isolation of specific fourier pupil frequency in overlay metrology" (Israeli, American Inventors)

ALEXANDRIA, Va., Dec. 2 -- United States Patent no. 12,487,190, issued on Dec. 2, was assigned to KLA Corp. (Milpitas, Calif.).

"System and method for isolation of specific fourier pupil frequency in overlay metrology" was invented by Yuri Paskover (Milpitas, Calif.), Itay Gdor (Tel-Aviv, Israel), Yuval Lubashevsky (Haifa, Israel), Vladimir Levinski (Nazareth Ilit, Israel), Alexander Volfman (Milpitas, Calif.), Yoram Uziel (Milpitas, Calif.) and Yevgeniy Men (Milpitas, Calif.).

According to the abstract* released by the U.S. Patent & Trademark Office: "A system includes an illumination source configured to generate an illumination beam, and a collection sub-system that includes an objective lens, one or more detectors located at a collect...