ALEXANDRIA, Va., Aug. 5 -- United States Patent no. 12,698,962, issued on Aug. 4, was assigned to KLA Corp. (Milpitas, Calif.).

"Metrology target for one-dimensional measurement of periodic misregistration" was invented by Yoel Feler (Haifa, Israel) and Mark Ghinovker (Yoqneam Ilit, Israel).

According to the abstract* released by the U.S. Patent & Trademark Office: "A metrology target includes a first target structure set having one or more first target structures formed within at least one of a first working zone or a second working zone of a sample. The metrology target includes a second target structure set having one or more second target structures formed within at least one of the first working zone or the second working zone. The f...