ALEXANDRIA, Va., Aug. 12 -- United States Patent no. 12,704,788, issued on Aug. 11, was assigned to KLA Corp. (Milpitas, Calif.).
"Parallax method for a single-cell diffraction based measurement of misregistration" was invented by Mordechy Kot (Migdal Haemek, Israel) and Yuval Lamhot (Haifa, Israel).
According to the abstract* released by the U.S. Patent & Trademark Office: "An overlay metrology system may illuminate overlay targets sample with a dipole pair of illumination beams, generate a first set of metrology data associated with two or more cells having nonzero offset values from a first set of the overlay targets, determine overlay measurements for the first set of overlay targets, determine effective stack heights representative o...