US Patent Issued to KLA on Aug. 11 for "Methods and systems for nanoscale imaging based on second harmonic signal generation and through-focus scanning optical microscopy" (California Inventors)

ALEXANDRIA, Va., Aug. 12 -- United States Patent no. 12,704,465, issued on Aug. 11, was assigned to KLA Corp. (Milpitas, Calif.).

"Methods and systems for nanoscale imaging based on second harmonic signal generation and through-focus scanning optical microscopy" was invented by Qiang Zhao (Milpitas, Calif.) and Ming Di (Pleasanton, Calif.).

According to the abstract* released by the U.S. Patent & Trademark Office: "Methods and systems for improved detection of defects of interest and measurement of structures buried within complex three dimensional semiconductor structures are described herein. Through-focus scanning optical microscopy (TSOM) using non-linear, second harmonic generation (SHG) light signals emitted from a sample provides i...