US Patent Issued to Kioxia on March 3 for "Exposure apparatus, exposure method, and method for manufacturing semiconductor device" (Japanese Inventor)

ALEXANDRIA, Va., March 3 -- United States Patent no. 12,566,386, issued on March 3, was assigned to Kioxia Corp. (Tokyo).

"Exposure apparatus, exposure method, and method for manufacturing semiconductor device" was invented by Yoshio Mizuta (Yokkaichi Mie, Japan).

According to the abstract* released by the U.S. Patent & Trademark Office: "An exposure apparatus according to one embodiment includes a stage and a control device. In an exposure process, the control device is configured to: calculate a calculated value of a magnification component by performing function approximation on measurement results of three or more alignment marks arranged on the substrate; set a first lower limit value and/or a first upper limit value for an alignment...