US Patent Issued to JUSUNG ENGINEERING on Oct. 6 for "Substrate processing device and method for cleaning substrate processing device" (South Korean Inventors)

ALEXANDRIA, Va., Oct. 6 -- United States Patent no. 12,753,506, issued on Oct. 6, was assigned to JUSUNG ENGINEERING Co. LTD. (South Korea).

"Substrate processing device and method for cleaning substrate processing device" was invented by Won Tae Cho (Gwangju-Si, South Korea), Yo Han Bang (Gwangju-Si, South Korea), Tae Yang Jang (Gwangju-Si, South Korea) and Chul Joo Hwang (Gwangju-Si, South Korea).

According to the abstract* released by the U.S. Patent & Trademark Office: "A substrate processing apparatus includes a chamber, a substrate support positioned inside the chamber and supporting a substrate, an edge frame disposed above the substrate support and extending outward from an edge of the substrate support, and a gas flow-controlling...