US Patent Issued to JUSUNG ENGINEERING on Feb. 10 for "Substrate processing device, method for preparing substrate processing device, and substrate processing method" (South Korean Inventors)

ALEXANDRIA, Va., Feb. 11 -- United States Patent no. 12,548,736, issued on Feb. 10, was assigned to JUSUNG ENGINEERING Co. LTD. (South Korea).

"Substrate processing device, method for preparing substrate processing device, and substrate processing method" was invented by Won Tae Cho (Gwangju-si, South Korea) and Chul Joo Hwang (Gwangju-si, South Korea).

According to the abstract* released by the U.S. Patent & Trademark Office: "Provided is an apparatus for processing a substrate, which includes a chamber having a processing space in which a process of depositing a thin-film on a substrate is performed and a structure which is installed to expose at least one surface to the processing space and in which a coating layer made of a polymer fo...