US Patent Issued to JILIN UNIVERSITY on Sept. 1 for "In-situ micro-nano impact indentation testing instrument" (Chinese Inventors)

ALEXANDRIA, Va., Sept. 1 -- United States Patent no. 12,723,958, issued on Sept. 1, was assigned to JILIN UNIVERSITY (Changchun, China).

"In-situ micro-nano impact indentation testing instrument" was invented by Zhichao Ma (Changchun, China), Guoxiang Shen (Changchun, China), Jiazheng Sun (Changchun, China), Wei Zhang (Changchun, China), Hongcai Xie (Changchun, China), Shuai Tong (Changchun, China), Junming Xiong (Changchun, China), Zixin Guo (Changchun, China), Wenyang Zhao (Changchun, China), Cong Li (Changchun, China), Yicheng Li (Changchun, China), Boyi Kou (Changchun, China), Zaizheng Yang (Changchun, China) and Jiakai Li (Changchun, China).

According to the abstract* released by the U.S. Patent & Trademark Office: "The present inven...