US Patent Issued to JEOL on June 23 for "Polymer analysis apparatus and method" (Japanese Inventors)

ALEXANDRIA, Va., July 15 -- United States Patent no. 12,663,404, issued on June 23, was assigned to JEOL Ltd. (Tokyo).

"Polymer analysis apparatus and method" was invented by Takaya Satoh (Tokyo), Masahiro Hashimoto (Tokyo) and Haruo Iwabuchi (Tokyo).

According to the abstract* released by the U.S. Patent & Trademark Office: "A second polymer is prepared through derivatization of a first polymer. Kendrick Mass Defect (KMD) analysis is applied on a mass spectrum of the second polymer, to thereby produce a plot. Meanwhile, a plurality of mass candidates for a non-primary-chain segment are calculated based on a mass spectrum of the first polymer. The KMD analysis is applied on the plurality of mass candidates, to thereby produce reference im...