ALEXANDRIA, Va., July 7 -- United States Patent no. 12,676,290, issued on July 7, was assigned to JEHARA Corp. (Suwon-si, South Korea).

"Plasma generator and method of using same" was invented by Hongseub Kim (Hwaseong-si, South Korea).

According to the abstract* released by the U.S. Patent & Trademark Office: "A plasma generator and a method of using the same are proposed. The disclosed relates to a plasma generator and a method of using the same capable of improving the uniformity of plasma used in a semiconductor manufacturing process and forming fine patterns and patterns having a high aspect ratio by precisely controlling ion energy. The plasma generator includes a vacuum chamber, a source electrode provided in the vacuum chamber, a ...