US Patent Issued to JAPAN MATERIAL TECHNOLOGIES on June 23 for "Inorganic compound, dispersion and method for producing same, and film and method for producing same, inorganic compound, method for producing methane and hydrogen, dispersion and method for producing same, and film and method for producing same" (Japanese Inventor)

ALEXANDRIA, Va., July 15 -- United States Patent no. 12,661,639, issued on June 23, was assigned to JAPAN MATERIAL TECHNOLOGIES Corp. (Tokyo).

"Inorganic compound, dispersion and method for producing same, and film and method for producing same, inorganic compound, method for producing methane and hydrogen, dispersion and method for producing same, and film and method for producing same" was invented by Hirotaka Ooi (Tokyo).

According to the abstract* released by the U.S. Patent & Trademark Office: "This inorganic compound includes M, O, and F, in which M is one or more kinds of transition metal elements, when defining a molar ratio of O as "b" and defining a molar ratio of F as "c", (b/c) is 0.60 or more and 2.30 or less, and a half-valu...