ALEXANDRIA, Va., July 28 -- United States Patent no. 12,692,590, issued on July 28, was assigned to Japan Display Inc. (Tokyo).
"Film formation apparatus" was invented by Masanobu Ikeda (Tokyo) and Masumi Nishimura (Tokyo).
According to the abstract* released by the U.S. Patent & Trademark Office: "A film formation apparatus includes a vacuum chamber, a substrate support portion and a target support portion provided in the vacuum chamber, a sputtering gas supply unit for supplying a sputtering gas to the vacuum chamber, a sputtering power supply, a first radical supply source connected to the vacuum chamber and configured to be capable of supplying at least one of nitrogen radicals generated from an N2 gas and hydrogen radicals generated ...