US Patent Issued to IUCF-HYU(INDUSTRY-UNIVERSITY COOPERATION FOUNDATION HANYANG UNIVERSITY) on Oct. 27 for "Device and method for measuring refraction coefficient and extinction coefficient of EUV mask material" (South Korean Inventors)

ALEXANDRIA, Va., Oct. 27 -- United States Patent no. 12,774,954, issued on Oct. 27, was assigned to IUCF-HYU(INDUSTRY-UNIVERSITY COOPERATION FOUNDATION HANYANG UNIVERSITY) (Seoul, South Korea).

"Device and method for measuring refraction coefficient and extinction coefficient of EUV mask material" was invented by Jinho Ahn (Seoul, South Korea), Dong Gi Lee (Seoul, South Korea), Young Woong Kim (Seoul, South Korea), Seungchan Moon (Seoul, South Korea) and Jin Hyuk Choi (Seoul, South Korea).

According to the abstract* released by the U.S. Patent & Trademark Office: "Provided is a device for measuring a refraction coefficient and an extinction coefficient. The device for measuring a refraction coefficient and an extinction coefficient may co...