ALEXANDRIA, Va., Feb. 11 -- United States Patent no. D1,112,717, issued on Feb. 10, was assigned to Iris Ohyama Inc. (Sendai, Japan).
"Face mask" was invented by Rie Maeda (Kakuda, Japan).
The patent was filed on July 12, 2021, under Application No. D/799,005.
*For further information, including images, charts and tables, please visit: http://patft.uspto.gov/netacgi/nph-Parser?Sect1=PTO2&Sect2=HITOFF&p=1&u=%2Fnetahtml%2FPTO%2Fsearch-bool.html&r=1&f=G&l=50&co1=AND&d=PTXT&s1=D1112717&OS=D1112717&RS=D1112717
Disclaimer: Curated by HT Syndication....