US Patent Issued to INVENTERA on Dec. 16 for "Method for increasing dispersion stability of nanoparticles as T1 MRI contrast agent and T1 MRI contrast nanoparticles" (South Korean Inventors)

ALEXANDRIA, Va., Dec. 16 -- United States Patent no. 12,496,363, issued on Dec. 16, was assigned to INVENTERA INC. (Seoul, South Korea).

"Method for increasing dispersion stability of nanoparticles as T1 MRI contrast agent and T1 MRI contrast nanoparticles" was invented by Jin Woo Cheon (Seoul, South Korea) and Tae Hyun Shin (Seoul, South Korea).

According to the abstract* released by the U.S. Patent & Trademark Office: "The present invention improves an existing contrast agent, especially, a T1 contrast agent, and adopts a strategy in which the T1 contrast material is partially coated on a support surface to which a hydrophilic functional group is exposed. The partial coating strategy adopted in the present invention improves both the st...