US Patent Issued to InvenSense on Aug. 25 for "Selective hydrophobic layer removal using UV irradiation with non-aligned mask" (Japanese, American Inventors)

ALEXANDRIA, Va., Aug. 25 -- United States Patent no. 12,715,758, issued on Aug. 25, was assigned to InvenSense Inc. (San Jose, Calif.).

"Selective hydrophobic layer removal using UV irradiation with non-aligned mask" was invented by Jotaro Akiyama (Minami, Japan), Yuki Shibano (Tokyo), Kento Kaneko (Showa-machi, Japan), Daishi Arimatsu (Yamanashi-ken, Japan) and Troy Chase (San Jose, Calif.).

According to the abstract* released by the U.S. Patent & Trademark Office: "A sensing device is formed on a first side of a wafer device, forming a cavity between sensing device and the wafer device. An opening of the cavity faces away from the sensing device, positioned on a second side of the wafer device (positioned opposite to the first side). A ...