US Patent Issued to Intevac on Feb. 3 for "Cylindrical cathode and chamber using same for sputtering" (California Inventors)

ALEXANDRIA, Va., Feb. 3 -- United States Patent no. 12,542,263, issued on Feb. 3, was assigned to Intevac Inc. (Santa Clara, Calif.).

"Cylindrical cathode and chamber using same for sputtering" was invented by Samuel D. Harkness IV (El Cerrito, Calif.), Thomas P. Nolan (Fremont, Calif.), Jae Ha Choi (Pleasanton, Calif.), Alexander Vassilievich Demtchouk (Sunnyvale, Calif.) and Terry Bluck (Santa Clara, Calif.).

According to the abstract* released by the U.S. Patent & Trademark Office: "Sputtering system having cylindrical target with sputtering material on exterior surface; magnet arrangement inside the cylindrical target, having first set of magnets arranged on straight row, each having first pole facing interior wall of the target and s...