ALEXANDRIA, Va., Sept. 23 -- United States Patent no. 12,426,338, issued on Sept. 23, was assigned to International Business Machines Corp. (Armonk, N.Y.).

"Buried power rail with robust connection to a wrap around contact" was invented by Ruilong Xie (Niskayuna, N.Y.), Kangguo Cheng (Schenectady, N.Y.), Julien Frougier (Albany, N.Y.) and Chanro Park (Clifton Park, N.Y.).

According to the abstract* released by the U.S. Patent & Trademark Office: "A buried power rail contact structure is provided that wraps around a source/drain region of a first field effect transistor (FET), contacts a surface of a buried power rail, and has a reduced height as compared to a height of a neighboring source/drain contact structure that contacts a surface o...