ALEXANDRIA, Va., Sept. 24 -- United States Patent no. 12,745,617, issued on Sept. 22, was assigned to International Business Machines Corp. (Armonk, N.Y.).

"Improving via resistance to backside power rail" was invented by Tao Li (Slingerlands, N.Y.), Sagarika Mukesh (Albany, N.Y.), Liqiao Qin (Albany, N.Y.), Prabudhya Roy Chowdhury (Albany, N.Y.), Kisik Choi (Watervliet, N.Y.) and Ruilong Xie (Niskayuna, N.Y.).

According to the abstract* released by the U.S. Patent & Trademark Office: "A semiconductor device includes a backside power rail; a transistor source/drain structure that has a backside facing the backside power rail and has a frontside facing away from the backside power rail; and a via disposed between and electrically connectin...