US Patent Issued to International Business Machines on Sept. 1 for "Trench capacitor in backside diffusion break" (New York Inventors)

ALEXANDRIA, Va., Sept. 1 -- United States Patent no. 12,727,179, issued on Sept. 1, was assigned to International Business Machines Corp. (Armonk, N.Y.).

"Trench capacitor in backside diffusion break" was invented by Reinaldo Vega (Mahopac, N.Y.), Ruilong Xie (Niskayuna, N.Y.), Nicholas Anthony Lanzillo (Wynantskill, N.Y.), Takashi Ando (Eastchester, N.Y.), David Wolpert (Poughkeepsie, N.Y.) and James P Mazza (Saratoga Springs, N.Y.).

According to the abstract* released by the U.S. Patent & Trademark Office: "A first source drain region directly adjacent to a first nanosheet stack, a second source drain region directly adjacent to a second nanosheet stack, an inner electrode of a capacitor between the first source drain region and the sec...