ALEXANDRIA, Va., May 12 -- United States Patent no. 12,628,579, issued on May 12, was assigned to International Business Machines Corp. (Armonk, N.Y.).
"Ligand selection for ternary oxide thin films" was invented by Martin Michael Frank (Dobbs Ferry, N.Y.), John Rozen (Hastings on Hudson, N.Y.) and Yohei Ogawa (White Plains, N.Y.).
According to the abstract* released by the U.S. Patent & Trademark Office: "Embodiments of the present invention are directed to forming a ternary compound using a modified atomic layer deposition (ALD) process. In a non-limiting embodiment of the invention, a first precursor and a second precursor are selected. The first precursor includes a first metal and a first ligand. The second precursor includes a secon...