ALEXANDRIA, Va., July 16 -- United States Patent no. 12,672,333, issued on June 30, was assigned to International Business Machines Corp. (Armonk, N.Y.).
"Backside placeholder dielectric fill" was invented by Tsung-Sheng Kang (Ballston Lake, N.Y.), Tao Li (Slingerlands, N.Y.), Ruilong Xie (Niskayuna, N.Y.) and Min Gyu Sung (Latham, N.Y.).
According to the abstract* released by the U.S. Patent & Trademark Office: "Embodiments of the present disclosure are directed to processing methods and resulting structures for providing a backside placeholder dielectric fill to enable robust backside source/drain contacts. In a non-limiting embodiment, nanosheets having a first width are formed in a first region and nanosheets having a second width gre...