ALEXANDRIA, Va., June 16 -- United States Patent no. 12,660,281, issued on June 16, was assigned to International Business Machines Corp. (Armonk, N.Y.).

"Self-aligned gate jumper connecting adjacent gates" was invented by Julien Frougier (Albany, N.Y.), Ruilong Xie (Niskayuna, N.Y.), Min Gyu Sung (Latham, N.Y.) and Heng Wu (Santa Clara, Calif.).

According to the abstract* released by the U.S. Patent & Trademark Office: "An approach that provides a method for forming a semiconductor structure with a gate jumper. The semiconductor structure includes a source/drain contact for a semiconductor device and a dielectric cap on a top portion of the source/drain contact. The semiconductor structure includes two gates adjacent to the source/drain ...