ALEXANDRIA, Va., Jan. 28 -- United States Patent no. 12,538,565, issued on Jan. 27, was assigned to International Business Machines Corp. (Armonk, N.Y.).
"Self-aligned bottom spacer" was invented by Ruilong Xie (Niskayuna, N.Y.), Hemanth Jagannathan (Niskayuna, N.Y.), Jay William Strane (Warwick, N.Y.) and Kangguo Cheng (Schenectady, N.Y.).
According to the abstract* released by the U.S. Patent & Trademark Office: "Embodiments of present invention provide a method of forming a transistor structure. The method includes forming a set of vertical fins on top of a substrate; forming a conformal spacer lining the set of vertical fins and the substrate; forming sidewall spacers next to vertical portions of the conformal spacer; removing portion...