US Patent Issued to INTERNATIONAL BUSINESS MACHINES on Aug. 26 for "Machine learning for computational patterning" (New Jersey, New York Inventors)

ALEXANDRIA, Va., Aug. 26 -- United States Patent no. 12,400,144, issued on Aug. 26, was assigned to INTERNATIONAL BUSINESS MACHINES Corp. (Armonk, N.Y.).

"Machine learning for computational patterning" was invented by Cheng Chi (Jersey City, N.J.) and Julian Timothy Dolby (Bronx, N.Y.).

According to the abstract* released by the U.S. Patent & Trademark Office: "A computer-implemented method is provided for creating a photolithographic mask. The method includes, in a model building stage, obtaining lithography polygon coordinates from an input lithography target layout. The method further includes, in the model building stage, obtaining mask polygon coordinates from an input mask layout from a test mask. The method also includes, in the mo...