US Patent Issued to International Business Machines on Aug. 25 for "Placeholder with dielectric liner protection to prevent direct backside contact (DBC) from shorting to gate" (New York Inventors)

ALEXANDRIA, Va., Aug. 25 -- United States Patent no. 12,720,853, issued on Aug. 25, was assigned to International Business Machines Corp. (Armonk, N.Y.).

"Placeholder with dielectric liner protection to prevent direct backside contact (DBC) from shorting to gate" was invented by Tsung-Sheng Kang (Ballston Lake, N.Y.), Tao Li (Slingerlands, N.Y.), Ruilong Xie (Niskayuna, N.Y.) and Eric Miller (Albany, N.Y.).

According to the abstract* released by the U.S. Patent & Trademark Office: "A semiconductor structure includes a plurality of gate-all-around field effect transistors. Each of the gate-all-around field effect transistors includes first and second source-drain regions; at least one channel region interconnecting the first and second sou...