ALEXANDRIA, Va., April 15 -- United States Patent no. 12,604,716, issued on April 14, was assigned to International Business Machines Corp. (Armonk, N.Y.).

"Interconnect with two-dimensional free zero line end enclosure" was invented by Ruilong Xie (Niskayuna, N.Y.), Albert M. Chu (Nashua, N.H.), Nicholas Anthony Lanzillo (Wynantskill, N.Y.), Lawrence A. Clevenger (Saratoga Springs, N.Y.) and Huai Huang (Clifton Park, N.Y.).

According to the abstract* released by the U.S. Patent & Trademark Office: "Embodiments of the invention include providing interconnects with two-dimensional free zero line end enclosure. A first metal line is formed. A second metal line is connected by a via to the first metal line, the first metal line having a firs...