US Patent Issued to Intel on Sept. 8 for "Integrated circuit structures having uniform grid metal gate and trench contact plug for tub gates with pyramidal channel structures" (Oregon Inventors)

ALEXANDRIA, Va., Sept. 8 -- United States Patent no. 12,733,255, issued on Sept. 8, was assigned to Intel Corp. (Santa Clara, Calif.).

"Integrated circuit structures having uniform grid metal gate and trench contact plug for tub gates with pyramidal channel structures" was invented by Dan S. Lavric (Beaverton, Ore.), Shao Ming Koh (Tigard, Ore.), Anand S. Murthy (Portland, Ore.) and Mauro J. Kobrinsky (Portland, Ore.).

According to the abstract* released by the U.S. Patent & Trademark Office: "Integrated circuit structures having uniform grid metal gate and trench contact cut with pyramidal channel structures are described. For example, an integrated circuit structure includes a vertical stack of horizontal nanowires having a pyramidal pr...