ALEXANDRIA, Va., Sept. 24 -- United States Patent no. 12,745,416, issued on Sept. 22, was assigned to Intel Corp. (Santa Clara, Calif.).
"Gate-all-around integrated circuit structures having fin stack isolation" was invented by Leonard P. Guler (Hillsboro, Ore.), Stephen Snyder (Portland, Ore.), Biswajeet Guha (Hillsboro, Ore.), William Hsu (Hillsboro, Ore.), Urusa Alaan (Hillsboro, Ore.), Tahir Ghani (Portland, Ore.), Michael K. Harper (Hillsboro, Ore.), Vivek Thirtha (Portland, Ore.), Shu Zhou (Portland, Ore.) and Nitesh Kumar (Beaverton, Ore.).
According to the abstract* released by the U.S. Patent & Trademark Office: "Gate-all-around integrated circuit structures having fin stack isolation, and methods of fabricating gate-all-around i...