US Patent Issued to Intel on Sept. 15 for "Vapor chamber with dynamically adjustable local evaporative resistance" (Indian Inventors)

ALEXANDRIA, Va., Sept. 15 -- United States Patent no. 12,740,017, issued on Sept. 15, was assigned to Intel Corp. (Santa Clara, Calif.).

"Vapor chamber with dynamically adjustable local evaporative resistance" was invented by Javed Shaikh (Bangalore, India), Kathiravan Dhandapani (Bangalore, India), Greeshmaja Govind (Edakkara, India), Asif S. Khan (Palakkad, India), Bijendra Singh (Bangalore, India) and Yagnesh V. Waghela (Bangalore, India).

According to the abstract* released by the U.S. Patent & Trademark Office: "Wire coils are distributed over the bottom surface of an inner chamber of a vapor chamber. The working fluid of the vapor chamber comprises ferromagnetic particles that are attracted to a wire coil as current passes through t...