US Patent Issued to Intel on Nov. 3 for "Integrated circuit structures having fin isolation regions recessed for gate contact" (Oregon Inventors)

ALEXANDRIA, Va., Nov. 3 -- United States Patent no. 12,787,426, issued on Nov. 3, was assigned to Intel Corp. (Santa Clara, Calif.).

"Integrated circuit structures having fin isolation regions recessed for gate contact" was invented by Leonard P. Guler (Hillsboro, Ore.), Clifford Ong (Portland, Ore.), Sukru Yemenicioglu (Portland, Ore.) and Tahir Ghani (Portland, Ore.).

According to the abstract* released by the U.S. Patent & Trademark Office: "Integrated circuit structures having fin isolation regions recessed for gate contact are described. In an example, an integrated circuit structure includes a vertical stack of horizontal nanowires over a first sub-fin. A gate structure is over the vertical stack of horizontal nanowires and on the f...